Au(111) on mica(order from here)

⇒保原大介：真空蒸着法による（111）単結晶面をもつ金薄膜の 作製方法


⇒原 正彦 (理研）：マイ カ上のAu(111)単結晶基板―その作製法と表面再配列構造の最近の話題―
   JSTAGE: 表 面科学　21, No.11 724-730 2000.



⇒mica上の金へのflame annealing M.H. Dishner et al. J. Vac. Sci. Technol. A 16 3295-3300  (1998)

⇒mica上へのultra-flat film(two step deposition) B. Lussem et al.  Appl. Surf. Sci. 249 197-202 (2005)
 　(1) a single step process with a constant deposition rate (0.1 nm/s)
 　(2) a two-step deposition process,
　　　 where a 150 nm gold film is deposited at a high rate (5 nm/s)
　　　　followed by a 50 nm gold film at a considerably reduced rate (0.05 nm/s).
   
    Prior to deposition, mica is freshly cleaved and then heated in vacuum for 6 h at the deposition temperature
    (460 °C for (1),  400 °C for (2)). Following the deposition the films are annealed
    for 1 h at the deposition temperature.

    The single step deposition process results in a film of many small (1–2 μm) grains with a hexagonal shape.

    Using the two-step deposition process introduced here the growth of the gold film can be changed from island
    to two-dimensional growth due to the improved wetting forced by the higher deposition rate in the first step.
    The extremely low deposition rate in the  second step causes a flattening of the surfaces by filling up the
    remaining trenches of the first step.. The resulting gold films exhibit
    a very low roughness on a large surface area (0.4 nm r.m.s. on 5 μm × 5 μm).
    From UHV-STM scans large atomically flat gold terraces (100–300 nm width)
    and two distinct structures can be seen: facets with linear step edges along the (01-1) directions and structures
    with rounded step edges.